Monday, February 20, 2006

New lithography keeps Moore's law on pace

A new photolithographic technology will create semiconductors with wires thinner than 30 nanometers, one-third the width in today's industry-standard chips, acoording to today's New York Times.

The new technology, known as immersion lithography, replaces the air gap between the optics and the wafer surface with a liquid, increasing resolution and depth of focus. Some of the materials issues have been discussed by scientists at IBM and JSR Micro.


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